多弧离子镀合金涂层的成分控制及阴极靶源的成分设计  

Control of Alloy Coating Composition Coated by Multi-arc Ion Plating and Design of Composition of Cathode Target Source

作　　者：王志海[1] 孙墨汉[1] 王希囡[1] 张钧[1] 

机构地区：[1]沈阳大学,辽宁沈阳110044

出　　处：《真空》2001年第1期12-14,共3页Vacuum

摘　　要：采用多弧离子镀制备的合金涂层成分与合金阴极靶之间通常存在一定程度的偏差。这种离析效应导致了合金涂层成分控制及合金靶材成分设计的困难。现在的研究工作提出了一个简易的公式an=[(an0 · fn) / i(ai0 · fi) ]· 10 0用于解决这些问题。此公式可以根据合金元素的离化率计算涂层的合金成分。计算结果与实验结果取得了较好的一致。改变该公式的表达方式 an0 =[(an/ fn) / i(ai/ fi) ]·10 0 % ,则易于完成阴极靶源的成分设计 ,并且实现合金涂层的理想成分。The composition generally changes from alloy cathode target to alloy coating deposited by multi arc ion plating to some extent. This demixing effect leads to the difficulties in the control of alloy composition of coating and in the design of composition of alloy cathode target. A simple formula, a n=[(a n 0·f n)/ i(a i 0·f i)]·100%, is proposed to deal with the problems. According to this formula, the composition of alloy coating can be calculated by means of the degrees of ionization of alloy elements. The results of calculation agree with the experimental ones. Modifying the formula into another form, a n 0=[(a n/f n)/ i(a i/f i)]·100% , the design for alloy composition of cathode target can easily carried out.

关 键 词：多弧离子镀 合金涂层 成分控制 阴极靶源 成分设计 合金靶 离析效应 

分 类 号：TG174.44[金属学及工艺—金属表面处理]