二甲亚砜中电沉积La-Co合金膜的研究(英文)  

Electrodeposition of La-Co Alloy Films in Dimethylsulfoxide (DMSO)

作　　者：袁定胜[1] 黄开胜[1] 刘冠昆[1] 童叶翔[1] 

机构地区：[1]中山大学化学与化学工程学院,广东广州510275

出　　处：《中山大学学报（自然科学版）》2001年第4期84-87,共4页Acta Scientiarum Naturalium Universitatis Sunyatseni

基　　金：广东省自然科学基金资助项目(960002)

摘　　要：研究在非水溶剂二甲亚砜中电沉积Ｌａ－Ｃｏ合金膜．体系中加入柠檬酸为络合剂，聚乙醇－ｌ０００ 为添加剂，用于改善沉积层的质量．在沉积过程中，应用了恒电位电解技术和脉冲电解技术．所得Ｌａ－Ｃｏ合金膜的表面是光滑，致密，粘附性好和有金属光泽．恒电位电解技术沉积得到的Ｌａ－Ｃｏ合金膜中Ｌａ的质量分数是２２．４２％～５０．２９％．脉冲电解技术沉积得到的Ｌａ－Ｃｏ合金膜中Ｌａ的质量分数是１．４６％～４２．６３％．脉冲电解技术沉积得到的Ｌａ－Ｃｏ合金膜通过电镜观察发现金属粒子的大小约为 １００ ｎｍ．This paper reported the electrodeposition of La-Co alloy films in dimethylsulfoxide (DM50). Citric acid as the complexing agent and polyethylene glycol-l000 as the additive were discussed. Potentiostatic and pulse electrolysis techniques were used to prepare La-Co alloy films. Surfaces of alloy films obtained by these two techniques are smooth, adhesive, compact and metallic luster. The contents of La in alloy films obtained by potentiostatic electrolysis technique are in the range of 22.42% to 50.29%, while deposited by pulse electrolysis technique are in the range of 1.46% to 42.63%. The size of metal grains obtained by pulse technique is about 100 nm.

关 键 词：二甲亚砜 镧-钴合金膜 电沉积 恒电位电解技术 脉冲电解技术 络合剂 添加剂 

分 类 号：TQ153.1[化学工程—电化学工业]