薄膜X射线应力测试三种衍射几何比较  

COMPARISON OF THREE DIFFRACTION GEOMETRIES IN X-RAY STRESS TESTINGS OF THIN FILM

作　　者：张铭[1] 何家文[1] 

机构地区：[1]西安交通大学

出　　处：《兵器材料科学与工程》2001年第1期68-72,共5页Ordnance Material Science and Engineering

基　　金：国家自然科学基金资助项目!(编号 :5 973 10 2 0 )

摘　　要：对比了薄膜 X射线应力测试的三种衍射几何 ,结果表明掠射侧倾法具有透入深度浅、透入深度随ψ角变化不大、对织构影响不敏感以及没有无应力试样的正、负ψ曲线分离等优点 ,所以掠射侧倾法是一种更适于薄膜应力测量的测试方法。应用掠射侧倾法测量了 PVD和 PCVD工艺的 Ti N薄膜的内应力情况 ,结果表明制备工艺对于气相沉积膜内的应力状态有较大影响。Three kinds of diffraction geometies in the X-ray stress testings of thin film were compared.The results show that the glancing side-incline method has the merits of shallow penetrotion depth,little chage on penetration depth with ψ angle,little effect on texture,and having no separation of positive and negative ψ curves during testing unstressed examples,so it is a kind of testing method that is more suitable for measuring the stress of thin film.The internal stress of TiN thin film produced by PVD and PCVD techniques was measured by the glancing side-incline method ,and the results show that the stress state in the vapour-deposition film was affected greatly by the preparing processing.

关 键 词：掠射侧倾法 常规法 侧倾法 薄膜 X射线应力测试 衍射几何 

分 类 号：O434.12[机械工程—光学工程]