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作 者:石怀彬[1] 邵春林[1] 王相勤[1] 余增亮[1]
机构地区:[1]中国科学院等离子体物理研究所,合肥230031
出 处:《辐射研究与辐射工艺学报》2001年第3期231-235,共5页Journal of Radiation Research and Radiation Processing
基 金:国家自然科学基金 (2 9772 0 33)
摘 要:利用N2 常压弧光放电产生低能N+ ,经电场加速后注入胞嘧啶 (C)水溶液 ,研究了低能N+ 作用后胞嘧啶水溶液的 pH值、紫外、红外及核磁共振光谱的变化。结果表明 ,溶液PH值由于N+ 的注入而逐渐下降 ,低能N+ 对溶液样品造成了多种形式的损伤 ,形成丰富多彩的损伤产物。其中不仅包括水溶液中多种损伤碎片之间的重新化合 ,还包括N+ 与溶液中元素形成新的化学基团 ,继而与其它碎片结合形成产物 ,使外来的N+ “沉积”在溶液样品中。Low energy N + ions were produced by gas arc discharge and the ions were accelerated into cytosine ( C ) aqueous solution. Changes in pH, UV, FT-IR and 1H-NMR spectra of C solution after this kind of ions' action were investigated. It was showed that pH of the solution decreased with N + implantation, N + caused various damages on C molecules and many new substances were founded. These new substances were synthesized not only by combination of the damage fragments in the solution, but also by 'deposition' of N + from outside.
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