有限磁场作用下填充环形等离子体波导中功率流密度的计算  

Calculations of the power density of plasma waveguide in finite magnetic field

作　　者：李伟[1] 魏彦玉[1] 刘盛纲[1] 

机构地区：[1]电子科技大学高能电子学研究所,四川成都610054

出　　处：《强激光与粒子束》2001年第6期753-756,共4页High Power Laser and Particle Beams

基　　金：国家自然科学基金资助课题 (69493 5 0 0 );总装基金办课题 (99.JS.10 )

摘　　要：在考虑有限磁场的作用下 ,得到了填充等离子体的圆柱光滑波导中各场分量的表达式 ,然后导出了功率流密度的计算式。通过计算得出等离子体的密度和厚度对功率流密度有极大的影响 。The formula of power density of waveguide with annular plasma filled in finite magnetic field has been derived. In order to increase output power of high-power microwave devices, some parameters must be taken into account, such as the thickness and the density of the annular plasma. Through careful calculation, it has been found that there are great influences on the power density by the plasma density and the annular plasma thickness. The influential mechanism has been analyzed by calculating the electric field distributed on the transverse direction.

关 键 词：等离子体 功率流密度 有限磁场 波导 相对论微波器件 

分 类 号：TN128[电子电信—物理电子学]