光诱导聚合蒙脱土插层纳米复合材料的研究  

A STUDY ON THE PREPARATION OF POLYMER/MONTMORILLONITE NANO-COMPOSITE MATERIALS BY PHOTO-POLYMERIZATION

作　　者：王慧敏[1] 梅明华[2] 姜永才[2] 李青山[1] 张晓宏[2] 吴世康[2] 

机构地区：[1]齐齐哈尔大学材料科学与工程系,黑龙江161006 [2]中国科学院理化技术研究所,北京100101

出　　处：《感光科学与光化学》2001年第4期250-256,共7页Photographic Science and Photochemistry

基　　金：国家自然科学基金资助项目 (批准号 :2 97331 0 0 ) ;国家 973项目 (G2 0 0 0 0 781 0 0 )

摘　　要：用两种光聚合法研究了蒙脱土插层复合材料的制备 .用小角X光衍射技术对产物内蒙脱土的结构进行表征 ,结果表明 ,蒙脱土经改性后能很好地使聚合单体及预聚物插入黏土层内并在光照下“就地”聚合生成光聚合复合材料 .The preparation of polymer/montmorillonite intercalation composite materials has been studied by applying two kinds of photo polymerization reaction (photo acid generation and photo radical generation)in this work.Small angle X ray diffraction technique was used for the structural characterization of montmorillonite contained in the products.Results indicated that after surface modification of montmorillonite the monomer(methyl methacrylate,MMA)and the prepolymer (m cresol/HMMM) were able to intercalate into the layers of the clay and to polymerize 'in situ' to obtain photo polymerized composite materials.The advantages and the demerits of the method of photo polymerization for preparation of these composite materials have been discussed preliminaryly.

关 键 词：光聚合 蒙脱土 插层复合 聚合物 小角X-光衍射技术 纳米复合材料 

分 类 号：TB33[一般工业技术—材料科学与工程]