大尺寸光通讯磁光薄膜衬底钆镓石榴石(Gd_3Ga_5O_(12))单晶的生长研究  

Growth Investigations of Large Size Magneto-optic Film Substrate Gd_3Ga_5O_(12) (GGG) Single Crystals for Optical Communications

作　　者：赵广军[1] 李涛[1] 徐军[1] 

机构地区：[1]中国科学院上海光学精密机械研究所,上海201800

出　　处：《人工晶体学报》2001年第4期341-347,共7页Journal of Synthetic Crystals

基　　金：中国科学院重点项目;中国科学院高技术研究与发展局资助项目

摘　　要：随着光纤通讯产业的迅猛发展 ,市场对 3英寸光通讯磁光薄膜衬底钆镓石榴石 (分子式为Gd3 Ga5O12 ,简称GGG)的需求量急剧增加。本文从磁光薄膜 (YIG以及类YIG)对其外延基底单晶GGG物化性能的要求出发 ,综述了在利用传统的提拉法生长大尺寸、符合磁光薄膜衬底要求的Gd3 Ga5O12 单晶的过程中 ,出现的诸如Ga2 O3 组分挥发 ,界面翻转 ,螺旋生长和晶体的开裂等问题 ,针对各个问题讨论了它们的形成机制并提出了它们的解决方法。最后 ,还根据目前磁光薄膜的发展情况 。With rapid development of optic fiber communications in recent years,the market demands of gadolinium gallium garnet (GGG) single crystals with diameter of 3 inches will be largely increased.GGG single crystals have been regarded as the ideal substrates for magneto optic epitaxial films (YIG and quasi YIG) which are commonly used in optical communications.From the view of the requirements of GGG substrates for epitaxial films used in optical communications,the problems such as gallium oxide evaporation,solid/liquid interface inversion,spiral growth and cracks encountered during large sized GGG single crystal grown by Cz method,have been investigated in this paper,and the solutions to cope with these problems are also suggested.In the end of the article,the trends of experimenting on GGG and substituted GGG sing crystals are indicated,in terms of development of magneto optical epitaxial films at present.

关 键 词：YIG GGG 螺旋生长 提拉法 组分挥发 单晶生长 界面翻转 大尺寸 光通讯 磁光薄膜 钆镓石榴石 衬底 

分 类 号：O782[理学—晶体学] TN204[电子电信—物理电子学]