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作 者:胡义华[1] 刘美希[1] 陈丽[1] 王小涓[1] 储焰南[2] 曹德兆[2]
机构地区:[1]广东工业大学应用物理系,广州510090 [2]中科院安徽光学精密机械研究所激光光谱学研究室,合肥230031
出 处:《量子电子学报》2001年第4期320-323,共4页Chinese Journal of Quantum Electronics
摘 要:本文在流动余辉装置上,研究了亚稳态He(23S)原子与N2H4分子碰撞传能,观察到了激发态产物NH(A3II→X3∑+)、NH(c1II→a1△)、NH2(A2A1→X2B1)的发射光谱,由相对光谱强度求得了形成各产物的通道比;分析NH(A3II,v'=0)的转动分辨谱的结果表明,v'=0能级上的转动布居是'双模”分布,激发态产物NH(A)、NH2(A)的形成机理可能是: He(23S)+N2H4→N2H4*→NH(A)+NH2(A)+H.The energy transfer reaction of metastable atom He(2-3S) with molecule N2H4 was studied using discharge-flowing afterglow technique. The emission spectrum of excited radical NH(A3∏→X3∑+). NH(c1∏→a1△). NH2(A2A1 → X2B1) were observed. The ratios of formation products exit were obtained by relative spectra intensity. The emission rotational spectra of product NH(A3∏, v′= 0) were analysed, the results showed that rotational populations were ' two models'. The formation mechanism of excited products was: He (2-3S)+N2H4→N2H4→NH(A)+ NH2(A)+H.
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