水基清洗技术在彩管荫罩清洗中的应用  

The Application of Water Basis CleaningTechnology in the CPT Shadow Mask Cleaning

作　　者：王建平 边辉 郭荒 

机构地区：[1]彩虹显示器件股份有限公司,陕西咸阳712021

出　　处：《真空电子技术》2001年第4期47-50,共4页Vacuum Electronics

摘　　要：本文结合生产实际 ,着重论述了将水基碱性清洗技术应用于成型荫罩的清洗工序 ,通过对工艺条件的摸索、对重大工艺不良采取了对策和对设备进行了必要的改造 ,最终达到了良好的清洗效果 ,从而结束了使用对臭氧层有破坏作用的三氯乙烷清洗荫罩的历史。Based on our experiences from production,this article emphatically dissertates the application of water basis alkalescence cleaning technology in the cleaning Procedure of molding mask.By investigating the technology conditions,exploring solutions to deal with production rejects and necessary rebuilding works of equipment,satisfied cleaning results have been obtained,that will bring the history of always using thichloroethane an ozonosphere destroying material to clean shadow mask to the end.

关 键 词：清洗 水基碱性 三氯乙烷 彩管 荫罩 

分 类 号：TN141.32[电子电信—物理电子学]