用大气压离子质谱测定高纯氮中的痕量N_2O和NO  

Determination of Trace Impurities N_2O and NO in High Purity Nitrogen Gas by Atmospheric Pressure Ionization Mass Spectrometer

作　　者：周泽义[1] 谌永华[1] 梁建平[1] 腾跃[1] 盖量京[1] 

机构地区：[1]国家标准物质研究中心,北京100013

出　　处：《质谱学报》2001年第3期21-28,共8页Journal of Chinese Mass Spectrometry Society

基　　金：国家标准物质研究中心基础研究基金资助

摘　　要：本文介绍了用大气压离子质谱 (API -MS)分析气体中痕量组分的方法 ,并用API-MS测定了高纯氮中的痕量组分N2 O和NO ,不确定度分别为 1 5%和1 7%。探讨了API-MS分析条件和影响因素。This paper expressed the methods of determination of trace impurities in gases by Atmospheric Pressure Ionization Mass Spectrometer (API-MS). The trace impurities N 2O and NO in high purity nitrogen gas were determined quantitatively by API-MS, and the total uncertainty of the method was 15% and 17%, respectively. The analysis conditions and effects with determination of N 2O and NO by API-MS were studied and discussed.

关 键 词：大气压离子质谱 高纯氮气 痕量组分 氧化二氮 定量分析 一氧化氮 

分 类 号：TQ116.15[化学工程—无机化工] O657.63[理学—分析化学]