氦离子辐照非晶态合金的表面损伤研究  

Surface topography of amorphous alloys bombarded with helium ions

作　　者：侯明东[1] 刘杰[1] 张庆祥[1] 刘刚[1] 

机构地区：[1]中国科学院近代物理研究所,兰州730000

出　　处：《核技术》2002年第1期1-8,共8页Nuclear Techniques

基　　金：国家自然科学基金 (19775 0 5 8和 10 0 75 0 6 4)资助项目 ;中国科学院"九五"重点项目 (KJ95 2 -S1- 42 3) ;甘肃省自然科学基金 (ZR96 - 0 2 5 )项目

摘　　要：用扫描电子显微镜研究了室温下氦离子辐照Fe77Ni5B18等 10种非晶态合金的表面形貌。氦离子的能量为 4 0keV和 6 0keV ,总注量为 1.0× 10 18— 4 .0× 10 18He/cm2 。对于不同的注量和不同的材料 ,观察到了层离、发泡、剥落、发泡破裂、二代发泡和多孔结构等多种表面损伤类型。测量了泡的直径和剥落泡皮的厚度 ,并讨论了表面损伤类型和初现的临界注量与材料种类和离子能量的关系。The blistering and flaking behavior of many kinds of amorphous alloys under helium ion bombardment at room temperature has been investigated. Helium ions with energies of 40keV and 60keV were implanted to the dose range 1.0×10 18-4.0×10 18 ions/cm 2. The surface topography of samples after irradiation was observed by using a scanning electron microscope. The diameter of blister and the thickness of exfoliated blister lids were measured. The results showed that many kinds of surface topography characteristics appeared for different doses, energies and amorphous alloys, such as flaking, blistering, exfoliation, blister rupture, second-generation blistering and porous structure. The dependence of surface damage modes and the critical dose for onset of blistering and flaking on material sort and ion energy was discussed.

关 键 词：氦离子注入 表面损伤 非晶态合金 氦离子辐照 表面形貌 聚变堆 材料 抗辐射能力 

分 类 号：TL627[核科学技术—核技术及应用] O571.33[理学—粒子物理与原子核物理]