聚丙烯核孔膜化学蚀刻工艺研究  

A study on the chemical etching of polypropylene nuclear track membrane

作　　者：孙志国[1] 张泉荣[1] 何向明[1] 严玉顺[1] 

机构地区：[1]清华大学核能技术设计研究院,北京102201

出　　处：《核技术》2002年第1期36-40,共5页Nuclear Techniques

摘　　要：探讨了蚀刻剂中重铬酸钾浓度、硫酸浓度及蚀刻温度、蚀刻时间等因素对聚丙烯膜基体蚀刻速率的影响 ;建立了基体蚀刻速率与重铬酸钾浓度、硫酸浓度、蚀刻温度的数学关联式 ;并选择一定的蚀刻条件对辐照过的聚丙烯膜进行蚀刻 ,得到了预期孔径的聚丙烯核孔膜。The chemical etching techniques of polypropylene (PP) nuclear track membrane were studied. The effects of potassium dichromate concentration, sulfuric acid concentration, etching temperature and etching time on the bulk etching rate of PP nuclear track membrane were discussed. A mathematical relation has been established. Under certain etching conditions, the expected PP nuclear track membranes were made by etching the irradiated PP membrane, affirming the mathematical relation.

关 键 词：核孔膜 聚丙烯 基体蚀刻速率 化学蚀刻工艺 蚀刻剂 塑料薄膜 重离子照射 

分 类 号：TQ325.14[化学工程—合成树脂塑料工业] TQ320.721