光波导用玻璃薄膜的制备及其性能研究  

Preparation and Characteristics of Glass Thin-film for Optical Waveguides Deposited by the Magnetron Sputtering

作　　者：王浩敏[1] 李佐宜[1] 林更琪[1] 胡雪涛[1] 廖红伟[1] 

机构地区：[1]华中科技大学电子科学与技术系,武汉430074

出　　处：《光电子技术与信息》2002年第1期28-31,共4页Optoelectronic Technology & Information

基　　金：华中科技大学激光技术国家重点实验室基金资助项目

摘　　要：采用磁控射频溅射法制备光波导用玻璃薄膜。本文重点分析了不同溅射条件如氧分压、基片种类、基片温度下制备的薄膜光学性能，通过比较，得到制备０．６３２８μｍ和１．５５μｍ窗口下光波导器件用玻璃薄膜所需溅射条件。The glass thin film for optical waveguides is deposited by the magnetron sputtering ?The optical characteristics of glass thin films made by different sputtering technology conditions, such as oxygen content, substrate and substrate temperature are measured and analyzed. The waveguides capability of the thin film are researched . The condition which should be provided with to deposit glass thin film in the windows of 0.6328 μm and 1.55 μm is educed .

关 键 词：玻璃薄膜 光波导 溅射工艺 制备工艺 

分 类 号：TN252[电子电信—物理电子学] TN814.6