脉冲电沉积钴镍合金层微观结构的研究  

Studies on the microstructure of pulse electrodeposited cobalt-nickel alloy deposits

作　　者：张芳[1] 荆天辅[1] 乔桂英[1] 赵军[1] 

机构地区：[1]燕山大学材料科学与工程学院,河北秦皇岛066004

出　　处：《电镀与涂饰》2001年第6期1-3,13,共4页Electroplating & Finishing

基　　金：河北省自然科学基金 (5 982 5 0 )

摘　　要：研究了钴镍合金镀液中Co2 +浓度与镀层中钴含量的关系 ,并采用XRD、TEM分析了不同钴含量合金镀层的微观结构。结果表明 ,沉积层中的钴含量随电解液中Co2 +浓度的增大而显著增大 ,当镀层中的钴含量为 6 9 8%～ 78 9% (质量分数 )时 ,镀层为面心立方晶格的α -Co相和排六方晶格的ε -Co相组成 ;钴含量低于 6 9 8%时为α -Co相 ;钴含量大于 78 9%时为ε -Co相。钴含量增大 ,晶粒尺寸明显减小 。The effect of cobalt ions in cobalt-nickel alloy bath on cobalt content in the alloy deposits was studied. Microstructure of the obtained cobalt-nickel alloy was analyzed by XRD and TEM. The results show that cobalt content in the alloy deposits increases with the increase of cobalt ions, cobalt-nickel alloy deposit is composed of face-centered cubic α phase and hexagonal close-packed ε phase when cobalt content is between 69.8% to 78.9%, cobalt-nickel alloy with lower cobalt content is single α phase, and cobalt-nickel alloy with higher cobalt contents is single ε phase. Grain size decreases greatly and lattice parameters increase with the increase of cobalt content in alloy deposit.

关 键 词：钴镍合金 脉冲电沉积 微观结构 电镀 

分 类 号：TQ153.2[化学工程—电化学工业]