等离子物理气相沉积设备研究及发展现状  

Research and Development of Plasma Physical Vapor Deposition Equipment

作　　者：苏育民 王伟平[1] 何箐[1] SU Yumin;WANG Weiping;HE Qing(Chinese Academy of Agricultural Mechanization Sciences,Beijing Jinlunkuntian Special Machine Co.,Ltd.,Beijing 100083, China)

机构地区：[1]中国农业机械化科学研究院北京金轮坤天特种机械有限公司

出　　处：《热加工工艺》2018年第22期21-26,共6页Hot Working Technology

摘　　要：热喷涂技术是表面工程领域一项重要的分支,在高性能涂层制备中已经得到越来越广泛的应用,特别在制备具有优良特性的热障涂层(Thermal Barrier Coatings,TBCs)中发挥重要作用。等离子物理气相沉积(Plasma Spray-Physical Vapor Deposition,PS-PVD)是基于低压等离子喷涂发展的一种快速多相调控涂层制备技术,可获得薄膜、致密涂层、柱状晶结构涂层。PS-PVD的工艺设备制造是一大难题,国外发展尚不足十年,我国的PS-PVD设备都来自进口,国内开展了相关设备的探索工作。本文从PS-PVD工艺的发展历程入手,重点阐述PS-PVD设备的基本构造及关键技术。最后,对其发展和应用前景进行展望。Thermal spraying technology is an important branch of surface engineering and has been widely used in high performance coating preparation.Especially in the preparation of excellent properties of thermal barrier coatings (TBCs)play an important role.Plasma Spray-Physical Vapor Deposition (PS-PVD)is a fast multi-phase controlled coating preparation technology based on low pressure plasma spraying.Thin film,dense coating and columnar crystal structure coating can be obtained.PS-PVD process equipment manufacturing is a big problem.Foreign development is still less than ten years,and China's PS-PVD equipment are imported.China carried out the exploration of related equipment.This paper starts with the development process of PS-PVD technology,and expatiates on the basic structure and key technology of PS-PVD equipment. Finally,its development and application prospects are looked ahead.

关 键 词：热障涂层 等离子物理气相沉积 喷涂设备 

分 类 号：TG178[金属学及工艺—金属表面处理]