石墨层间化合物稳定性的研究  

STUDY ON STABILITY OF GRAPHITE INTERCALATION COMPOUND

作　　者：刘道志[1] 蓝国祥[1] 扈士芬[1] 王华馥[1] 

机构地区：[1]南开大学

出　　处：《炭素》1991年第1期7-11,共5页Carbon

摘　　要：用喇曼散射方法观察了HClO_4、HNO_3、H_2SO_4—石墨层间化合物(GIC)的阶次状态随时间的变化,采用a面及c面入射观察。到HClO_4—GIC的阶次变化过程中ClO_4^-的溢出现象,据此认为层间化合物的阶次不稳定是由于插入的离子与石墨层间的分子力作用较弱。The change of stage state o?HC1O4, HNO3 and H2SO4-graphite intercalation compound with time was observed with Raman scattering method. The overflow phenomenon of ClO4- during stage change of HClO4-graphite intercalation compound was observed by incidence on plane of a and c. It was considered that the stage non-stability of intercalation compound was caused by weaker molecule action force between inserted ions and graphite intercalation.

关 键 词：石墨 层间化合物 稳定性 

分 类 号：O613.71[理学—无机化学]