壳聚糖与重氮树脂磺酸盐的感光性超薄膜  

Photosensitive Ultra-thin Films of Chitosan and Sulfonate of Diazoresin

作　　者：鲁从华[1] 曹廷炳[1] 罗传秋[1] 曹维孝[1] 

机构地区：[1]北京大学化学与分子工程学院,北京100871

出　　处：《高等学校化学学报》2002年第1期170-172,共3页Chemical Journal of Chinese Universities

基　　金：国家自然科学基金 (批准号 :39870 2 2 7及 5 0 1730 0 2 )资助

摘　　要：On the substrate of modified quartz, two kinds of self assembled ultra thin films were fabricated through layer by layer electrostatic deposition with diazoresin′s sulfonate(DRS) as the polyanion, and chitosan(CS) as the polycation. The self assembly process was monitored by UV Vis spectra and confirmed that the layer by layer deposition takes place regularly. The films obtained both from DRS, CS(CS/DRS film) and from DR, DRS, CS(DR/DRS/CS/DRS film) were photo sensitive. Under irradiation of ultraviolet light, the stability of the films towards polar solvents increases significantly. The kinetic study shows that the rate of the photodecomposition reaction of DR/DRS/CS/DRS films is higher than that of CS/DRS films and doesnt show the first order reaction for both films.On the substrate of modified quartz, two kinds of self assembled ultra thin films were fabricated through layer by layer electrostatic deposition with diazoresin′s sulfonate(DRS) as the polyanion, and chitosan(CS) as the polycation. The self assembly process was monitored by UV Vis spectra and confirmed that the layer by layer deposition takes place regularly. The films obtained both from DRS, CS(CS/DRS film) and from DR, DRS, CS(DR/DRS/CS/DRS film) were photo sensitive. Under irradiation of ultraviolet light, the stability of the films towards polar solvents increases significantly. The kinetic study shows that the rate of the photodecomposition reaction of DR/DRS/CS/DRS films is higher than that of CS/DRS films and doesnt show the first order reaction for both films.

关 键 词：壳聚糖 重氮树脂磺酸盐 感光性超薄膜 化学改性 稳定性 

分 类 号：O484[理学—固体物理] O636.1[理学—物理]