紫外光诱导哈茨木霉产生腐霉利抗性菌株的研究  被引量:21

UV-Induced Resistant Strains of Trichoderma harzianum to Procymidone

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作  者:丁中[1] 刘峰[1] 慕立义[1] 

机构地区:[1]山东农业大学植物保护学院,山东271018

出  处:《中国生物防治》2002年第2期75-78,共4页Chinese Journal of Biological Control

摘  要:通过紫外光照射结合使用含药培养基培养得到了 3个哈茨木霉腐霉利抗性突变菌株。抗性菌株与亲本菌株相比较 ,其抗药性提高 1 0 0倍以上 ,与异菌脲、菌核净和甲基立枯磷存在交互抗性。抗性菌株在无药培养基上连续转移培养 8次 ,抗性程度未见下降。在适合度上 ,抗性菌株的菌丝生长速率有所下降 ,而在产孢能力、活体抑菌能力上有的抗性菌株要高于亲本菌株。Three mutants resistant to procymidone were obtained by UV light induction on PDA amended with procymidone from a wild isolate of Trichoderma harzianum. Resistant level was over 100 times in comparison with that of the parent strain. There was cross resistance to iprodione, dimetachlone and tolclofos methyl. The mutants could maintain their resistance after 8 successive transfers on the fungicide free PDA. Some resistant strains showed reduced growth and sporulation. Three resistant strains retained the ability of antagonism against plant pathogenic Botrytis cinerea in vitro and vivo.

关 键 词:哈茨木霉 腐霉利 抗药性 紫外光诱导 抗性菌株 

分 类 号:S482.292[农业科学—农药学] Q754[农业科学—植物保护]

 

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