电磁复合场中电子成像系统的计算机辅助分析  

COMPUTER AIDED ANALYSIS OF ELECTRON IMAGE FORMING SYSTEMS IN COMBINED FOCUSING AND DEFLECTING FIELDS

作　　者：杨立才[1] 张涛[1] 裘培勇 

机构地区：[1]山东工业大学,济南250014

出　　处：《微细加工技术》1991年第2期20-24,共5页Microfabrication Technology

摘　　要：本文利用数值仿真技术对复合场中电子成像系统的像差理论做了研究。基于一种新的计算方法编写了一套完整的像差计算程序,由此可求得任意初始条件下复合场中电子成像系统的三级几何像差。其计算精度可比传统软件的提高四倍以上,为高精度电子光路的设计提供了可靠的理论工具。In this paper, the aberration theory of electron image forming systems in the combined focusing and deflecting field has been researched using the technology of numerical simulation. Based on a new calculation method,a set of programs used to calculate the third order geometrical aberrations in the combined focusing and deflecting filds has been written out. The precision of this software for calculating aberrations is about 4 times higher than traditional ones The conclusions given in this paper supplied the reliable theory for the design works of electron optics with higher precision.

关 键 词：电磁场 电子成像系统 CAD 像差 

分 类 号：TN16[电子电信—物理电子学]