ICP-AES法测定高温合金中痕量铪的研究  

Investigation on determination of trace hafnium in superalloy by ICP-AES

作　　者：杨桂香[1] 郑国经[1] 

机构地区：[1]首钢总公司冶金研究院,北京100085

出　　处：《冶金分析》2002年第2期1-5,共5页Metallurgical Analysis

摘　　要：采用ICP AES法对Hf 2 63 871nm ,2 64 14 1nm ,2 77 3 3 6nm ,2 82 0 2 2nm等灵敏谱线的分析性能进行研究 ,对高温合金中基体及合金元素的干扰情况进行考察 ,选用 2 82 0 2 2nm作为分析线 ,并测定了Ti对Hf的干扰校正系数 ,确定了采用基体匹配法和干扰系数校正法对高温合金中痕量铪进行直接测定。方法的实际测定下限为 0 0 0 0 5 % ,测定精度RSD≤2 0 %。In this paper, the analysis lines of 263 871,264 141,277 336,282 022nm for hafnium have been studied by inductively coupled plasma spectrometry the effect of spectrum interference for elements in alloy on the determination of trace hafnium was investigated The optimum analysis line of 282 022nm was selected and the correction coefficient for interference of titanium to hafnium was suggested. This method for the determination of trace hafnium in super alloy could be realized by the method of matching matrix and correction coefficient for interference. The low limit of determination was 0 0005% with RSD≤20%

关 键 词：ICP-AES法 高温合金 痕量 铪 

分 类 号：TG115.3[金属学及工艺—物理冶金]