离子镀铝工艺研究  

Study on Aluminium Ion Plating

作　　者：肖国珍[1] 焦文强[1] 黄春良[1] 蒲正利[1] 

机构地区：[1]西北有色金属研究院,宝鸡721014

出　　处：《稀有金属材料与工程》1991年第6期67-71,共5页Rare Metal Materials and Engineering

摘　　要：采用空心阴极离子镀设备,在Ti22合金螺栓上进行了离子气相沉积铝的研究。通过对枪功率、工件负偏压、烘烤温度、沉积真空度等工艺参数的研究以及对铝涂层结合力、纯度、厚度等检验,确定了Ti22螺栓镀铝工艺:使用石墨坩埚,在氩分压为(5—8)×10^(-2)pa、工件烘烤温度300℃、枪功率17—20kW、负偏压50V的条件下,可以镀制出与Ti22基材结合良好、纯度高于99%、均匀、光滑的铝涂层。By using a hollow cathode discharge ion plating equipment, aluminium ion vapour deposits on Ti22 belts was studied. After studying the coating processing parameters, such as capacity of the electron guns, negative bias, heating temperature, vacuum degree of deposition etc and examining the cohesion, purity and thickness of the aluminium film by SEM, EDAX and X-ray diffraction, the processing technique of aluminium ion plating on belt was determined. The final result reveals that aluminium film deposited on Ti22 substrate in black lead crucible is uniform and smooth, which possesses good adhesion and high purity(>99%), at the condition of Ar diffrential pressure: (5—8)×10^(-2)Pa, heating temperature 300℃, gun capacity: 17—20kW, negative bias 50V.

关 键 词：Ti22合金 铝 离子镀 

分 类 号：TG174.442[金属学及工艺—金属表面处理]