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作 者:曾兆华[1] 王霞 杨建文[1] 汪河洲 陈用烈[1]
机构地区:[1]中山大学化学与化学工程学院高分子研究所 [2]超快速激光光谱学国家重点实验室,广州510275
出 处:《高等学校化学学报》2002年第6期1205-1206,共2页Chemical Journal of Chinese Universities
基 金:广东省自然科学基金 (批准号 :0 1110 4);及国家自然科学基金 (批准号 :5 9973 0 2 7)资助
摘 要:Visible light curable photoresist consisting of epoxy resin Epon SU8 and iron arene photo initiator Irgacure 261 was used to fabricate three dimensional microstructure by means of three dimensional holographic lithography technique. Argon ion laser with wavelength of 488 nm was used as light source in the experiments. Field emission microscope diagram showed the formation of three dimensional microstructure. It was found that the amount of photo initiator, the laser intensity and the exposure time are the key factors to obtain well defined three dimensional microstructure.Visible light curable photoresist consisting of epoxy resin Epon SU8 and iron arene photo initiator Irgacure 261 was used to fabricate three dimensional microstructure by means of three dimensional holographic lithography technique. Argon ion laser with wavelength of 488 nm was used as light source in the experiments. Field emission microscope diagram showed the formation of three dimensional microstructure. It was found that the amount of photo initiator, the laser intensity and the exposure time are the key factors to obtain well defined three dimensional microstructure.
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