薄膜厚度对ZnO∶Al透明导电膜性能的影响  

Thickness Dependence of Properties for ZnO∶Al Transparent Conducting Films

作　　者：郝晓涛[1] 马瑾[1] 马洪磊[1] 杨莺歌[1] 王卿璞[1] 黄树来[1] 

机构地区：[1]山东大学物理与微电子学院,山东济南250100

出　　处：《液晶与显示》2002年第3期169-174,共6页Chinese Journal of Liquid Crystals and Displays

基　　金：国家自然科学基金资助项目 ( 6 9876 0 2 5 )

摘　　要：铝掺杂的氧化锌 (ZnO∶Al)透明导电膜是采用射频磁控溅射法在有机衬底 (Polypro pyleneadipate,PPA)和Corning 70 5 9玻璃上制备的。详细研究了薄膜的结构性质、光学和电学性质随薄膜厚度的变化关系。制备的ZnO∶Al薄膜具有 (0 0 2 )面的单一择优取向的多晶六角纤锌矿结构 ,性能优良的薄膜电阻率在两种衬底上分别为 2 .5 5× 1 0 - 3 Ω·cm和1 .89× 1 0 - 3 Ω·cm ,平均透射率达到了 80 %和 85 %。The ZnO∶Al films with different thickness were deposited on Corning 7059 glass and PPA substrates using a r.f. magnetron sputtering system. The thickness dependence of structural, optical and electrical properties of the ZnO∶Al films on polypropylene adipate (PPA) substrates have been studied in detail. Good films with resistivity as low as 2.55×10 -3 Ω·cm, 1.89×10 -3 Ω·cm and 80%, 85% transmittance in the visible region on glass and PPA substrates were prepared, respectively.

关 键 词：ZNO:AL 透明导电膜 薄膜厚度 柔性衬底 铝掺杂 氧化锌 结构 光学性质 电学性质 

分 类 号：O484.4[理学—固体物理] TM24[理学—物理]