导致光聚物全息存储布喇格偏移因素的研究  

THE FACTOR OF INTRODUCING THE BRAGG-MISMATCH DURING THE PHOTOPOLYMER HOLOGRAPHIC EXPOSURE

作　　者：黄明举[1,2] 姚华文[1] 陈仲裕[1] 侯立松[1] 干福熹[1] 

机构地区：[1]中国科学院上海光学精密机械研究所 [2]河南大学物理系,河南开封475001

出　　处：《光子学报》2002年第7期855-859,共5页Acta Photonica Sinica

摘　　要：研究了光聚物高密度全息存储材料在全息记录过程中曝光量、曝光时间、厚度收缩比例、折射率调制度及记录角度等因素对布喇格偏移的影响规律 ,结果表明 :曝光量一定时 ,布喇格偏移与曝光时间的关系不大 ,当曝光量不一定时布喇格偏移随曝光时间增加缓慢增加最后达到饱和 ;而布喇格偏移随厚度收缩比例和折射率调制度的增加以接近正比例的关系增加 ;记录光栅的倾斜度越大则布喇格偏移也越大 .The factors such as exposure energy,exposure time,thickness shrindage percent,recording angles and refractive index modulation that introduce the Bragg mismatch during photopolymer holographic exposure are studied.The results show that for constant exposure energy,the exposure time influence the Bragg mismatch a little,for inconstant exposure energy,the Bragg mismatch increases with exposure energy at first,and reaches saturation when the exposure energy surpass an exposure threshold.The Bragg mismatch increases with the thickness shrinkage percent and refractive index modulation just about linearly.The more slanted the grating the larger Bragg mismatch will be.These results ane important to the study of the photopolymer high density holographic recording.

关 键 词：高密度全息存储 光聚物 布喇格偏移 曝光量 

分 类 号：TP333.4[自动化与计算机技术—计算机系统结构] O438[自动化与计算机技术—计算机科学与技术]