埋点靶制备工艺研究  

Study on the Fabrication Technology of the Microspot Targets

作　　者：张占文[1] 许华[1] 魏胜[1] 吴卫东[1] 余斌[1] 张昭瑞[1] 黄丽珍[1] 罗青[1] 袁玉萍[1] 高党忠[1] 袁光辉[1] 郑永铭[1] 陆晓明[1] 

机构地区：[1]中国工程物理研究院激光聚变研究中心,四川绵阳621900

出　　处：《原子能科学技术》2002年第4期313-315,共3页Atomic Energy Science and Technology

基　　金：国防预先研究基金资助项目 (5492);国家"863"惯性约束聚变领域资助项目 (863 41 6 3 3 3 1 1 )

摘　　要：研究了激光惯性约束聚变 (ICF)实验中一种基础基准靶埋点靶的制备工艺过程。埋点靶的制备过程主要包括CH膜的制备、埋点的定位和埋点材料的制备。其中 ,CH薄膜的制备及其性质是制备埋点靶的关键工艺环节。最后给出了埋点靶的制备工艺流程。The microspot target is one of the most important targets in the inertial confinement fusion(ICF) experiment, its fabrication technology is complicated. The target consists of a hydrocarbon(CH) film with a sharply defined spot(microspot) in the center seeded with another material. The target is fabricated using a three step procedure consisting of depositing the hydrocarbon film, defining the microspot, and depositing a seeded spot through a mask. The paper describes the production of CH film by the way of hot wire chemical vapor deposition, and focuses on the fabrication technology of the microspot target.

关 键 词：埋点靶 制备 CH薄膜 激光惯性约束聚变 

分 类 号：TL632.1[核科学技术—核技术及应用] TL503.4