常温氦离子注入纳米钛膜的微结构分析  

Microstructure Analysis of Helium Implantation on Nanometer Titanium Film at Room Temperature

作　　者：郑思孝[1] 罗顺忠[2] 刘仲阳[1] 龙兴贵[2] 王培禄 彭述明[2] 廖小东[1] 刘宁[1] 

机构地区：[1]四川大学原子核科学技术研究所辐射物理及技术教育部重点实验室,四川成都610064 [2]中国工程物理研究院核物理与化学研究所,四川绵阳621900

出　　处：《原子能科学技术》2002年第4期388-392,共5页Atomic Energy Science and Technology

摘　　要：在常温下 ,用 2 0 0、10 0keVHe离子按He Ti原子浓度比 0 1、0 3和 0 2的剂量注入纳米钛膜 ,采用现代表面分析技术对试样进行形貌观察与微观分析。测试分析结果表明 :注入前 ,沉积膜的原子力显微镜 (AFM )形貌像呈现从几十至 2 0 0nm以上极不均匀的晶粒尺度 ;注入后 ,3个试样的晶粒均有所长大 ,且随着注入剂量的增加 ,其长大趋势更为明显。这些长大的晶粒中同时存在大量的亚结构 ,表明在高剂量氦离子注入下 ,导致出现表层晶粒细化现象 ;He离子注入后的试样在衍射角 15°～ 40°之间出现可辨的衍射峰 ,其膜层内的平均晶粒尺寸约 13 6nm ,说明经离子注入后 ,膜层内纳米粒子的结晶度得到进一步提高 ,晶粒度比注入前长大。The nanometer titanium film implanted by helium is studied using a dose of 0.1, 0.3 and 0.2 with the energy of 200 and 100 keV at room temperature. The surface morphology and microstructure of the samples are determined by the advanced surface analysis technique. It is found that the surface morphology of atomic force microscope (AFM) micrograph shows crystal grain with extremely non homogeneity from several ten nanometers to two hundred nanometers before implantation, but the crystal grain of all three samples is grown after implantation, moreover, increases obviously with increasing implantation dose and large substructure grain appears in the grown grain. As a result, it indicates an important phenomenon that the grown grain might be crashed to smaller grain again during He + implantation with high dose. The average grain of the film is 136 nm calculated from the sharp peak of X ray diffraction under an angle of 2 θ =15°～40° after implantation. It is shown that the nanometer grain of the film is further increased, and it is in good agreement with that of AFM B micrograph in nm region.

关 键 词：氦离子注入 纳米钛膜 微结构分析 表面分析 贮氢材料 

分 类 号：TB383[一般工业技术—材料科学与工程] O484.1[理学—固体物理]