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出 处:《真空》1991年第3期18-21,10,共5页Vacuum
摘 要:本文利用蒙特卡洛方法对Y1Bα2Cu3O7-δ超导薄膜制备过程中, Y、Ba、Cu的溅射和沉积过程进行了模拟,得到了按各种角分布溅出的Y、Ba、Cu三种原子的沉积粒子数随R,z的变化规律,并通过计算结果与实验结果的比较初步确定了Y、Ba、Cu三种原子在被溅出时的角分布。In this paper, the course of sputtering and depositing were studied with Monte Carlo method in the process of making superconducting Y,Ba2Cu3O7-δ thin film. The relation between the deposition ratio and the radial position of substrates was calculated from different angular distributions also the relation between the deposition ratio and the axis position of substrates was calculated. By comparing the results of calculation with the results of experi ment, the angular distributions of Y, Ba, Cu were concluded when they were sputtered from Y1Ba2Cu3O7-δ targets.
分 类 号:TM262.05[一般工业技术—材料科学与工程]
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