电压对6061铝合金表面微弧氧化膜形成的影响  

Effects of Forward Voltage on Micro-arc Oxidation Film on 6061 Aluminium Alloy

作　　者：杨慧芳[1] 刘彩文[1] 吴士军[2] 

机构地区：[1]内蒙古工业大学材料科学与工程学院,内蒙古呼和浩特010051 [2]呼和浩特职业学院生物化学工程学院,内蒙古呼和浩特010070

出　　处：《铸造技术》2014年第6期1225-1227,共3页Foundry Technology

基　　金：内蒙古自治区自然科学基金项目(2013MS0812);内蒙古工业大学重点研究项目(ZD201214)

摘　　要：采用微弧氧化法在6061铝合金表面制备微弧氧化膜,研究氧化电压对微弧氧化正负向电流、膜层厚度和生长率的影响。结果表明,正向和负向电压分别为460 V和130 V时,正负向电流波动明显,膜层均匀,厚度为118μm,膜的生长率为3.93μm/min,膜层由疏松层和致密层组成,致密层所占比例约为95%。The micro-arc oxidation film on 6061 aluminium alloy were prepared by micro-arc oxidation, and the effects of forward voltage on forward and reforward current, thickness of membrane and growth rate were studied. The results show that the positive and negative current fluctuate obviously when the forward and reforward voltage are 460 V and 130 V, respectively. The thickness of the uniform membrane is 118 μm, and the growth rate is 3.93 μm/min. The membrane is composed of loose layer and density layer, and the proportion of the dense layer is about 95%.

关 键 词：正向电压 6061铝合金 微弧氧化 氧化膜 氧化电流 

分 类 号：TG174.4[金属学及工艺—金属表面处理]