LC4铝合金表面硬质阳极氧化膜制备及表征  

Preparation and Characterization of Hard Anodic Oxidation Film on LC4 Aluminum Alloy Surface

作　　者：王英才 陈岁元[2] 刘平平[2] 

机构地区：[1]沈阳航天新乐股份有限责任公司,沈阳110004 [2]东北大学材料各向异性与织构教育部重点实验室,沈阳110004

出　　处：《表面技术》2014年第4期37-42,共6页Surface Technology

基　　金：辽宁省教育厅科学技术研究项目(LT2010031);沈阳市科技工业攻关项目(F11-042-2-00)~~

摘　　要：目的：在 LC4铝合金表面制备硬质阳极氧化膜,讨论工艺参数对膜层厚度和硬度的影响。方法对阳极氧化的时间、温度、电流密度及正负脉冲电流时间比等参数进行优化实验,通过 OM,SEM,XRD 及显微硬度计等对制备的氧化膜层的厚度、硬度、形貌等进行研究。结果工艺优化后的参数为：温度-2~0℃,正脉冲电流密度4 A/ dm2,负脉冲电流密度1 A/ dm2,正负脉冲电流时间比6：1,氧化时间50 min。得到由一系列直径约为50 nm 的管状单元结构组成的氧化膜,其厚度为36μm,硬度为420HV。结论制备的阳极氧化膜具有致密的组织结构和高的硬度值。Objective The hard anodic oxidation films were prepared on the surface of the LC4 aluminum alloy and the effects of different parameters on the thickness and hardness of the films were discussed. Methods By optimizing parameters of the anodic oxidation time, temperature, current density and the positive and negative pulse time ratio, the thickness, hardness and microstructure of the films were studied by means of OM, SEM, XRD, and hardness tester. Results The optimized parameters were： a temperature of -2 ~ 0 ℃ , a positive pulse current density of 4 A/ dm2 , a negative pulse current density of 1 A/ dm2 , a positive and negative pulse current time ratio of 6 ： 1, and an oxidation time of 50 min. The structure of the oxide film on LC4 aluminum alloy was composed of a series of tubular cells with a diameter of 50 nm, the thickness of anodic oxidation film was 36 μm, and the hard-ness was 420HV. Conclusion The anodic oxidation film had fine structure and high hardness.

关 键 词：LC4 铝合金 阳极氧化膜 正负脉冲波形 硬度 

分 类 号：TG174.451[金属学及工艺—金属表面处理]