双注磁控注入电子枪  

Double-beam magnetron injection gun

作　　者：刘冲[1,2] 赵青[1] 胡以怀[2] 马春光[1] 林叶春[2] 王海燕[2] 李精明[2] 武起立[2] 

机构地区：[1]电子科技大学物理电子学院,成都611731 [2]上海海事大学商船学院,上海201306

出　　处：《强激光与粒子束》2014年第8期175-178,共4页High Power Laser and Particle Beams

基　　金：国家国际科技合作专项项目(2011DFA63190)

摘　　要：为了增加回旋管的功率,采用双注磁控注入电子枪产生相对论电子注。与双阳极磁控注入电子枪相比,双注磁控注入电子枪产生双束电子注,在不影响电子注质量的基础上,增加电子枪的电流;电子枪产生相同电流时,双注磁控注入电子枪电子注电流小,电子注电子之间的空间电荷效应小,能够降低电子注的速度零散,提高电子注的质量。采用MAGIC软件数值模拟双注磁控注入电子枪,设计出一支大束流、低速度零散的双注磁控注入电子枪。A double-beam magnetron injection gun was used to improve the output power of gyrotrons. A double-beam magnetron injection gun can output two relativistic electron beams, which is a better way to raise the current of the magnetron in- jection gun without reducing the quality of electron beams. Compared with the double-anode magnetron injection gun with the same output current, the double-beam magnetron injection gun can reduce velocity spread and improve the quality of electron beams, because of its smaller influence of the space charge. Using the software MAGIC, a double-beam magnetron injection gun with a modest velocity ratio and a low velocity spread of electron beams was designed.

关 键 词：回旋管 双注磁控注入电子枪 电子注 速度零散度 

分 类 号：TN12[电子电信—物理电子学]