Parallel laser writing system with scanning Dammann lithography  

作　　者：朱锋 麻健勇 黄巍 王津 周常河 

机构地区：[1]Lab of Information Optics and Optoelectronics Techniques,Shanghai Institute of Optics and Fine Mechanics,Chinese Academy of Sciences

出　　处：《Chinese Optics Letters》2014年第8期15-18,共4页中国光学快报（英文版）

基　　金：the National Natural Science Foundation of China(Nos.61307064 and 61127013);the Ministry of Science and Technology of the Peo-ple’s Republic of China(No.2012YQ170004).

摘　　要：Scanning Dammann lithography （SDL） is proposed and implemented, which uses a Danunann grating to generate multiple beams with sharp step boundary for writing large-sized gratings efficiently. One of the most attractive advantages is that this technique can accelerate tile writing speed, e.g. 1×32 Damnlann grating can be 32 times faster than the single laser scanning system. More importantly, the uniformity of the multi-beams-written lines is much better than the single la.ser beam scanning system in consideration of the environlnental effects such as air turbulence, thermal instability, etc. Using the SDL system, a three-port high-efficiency beam splitter at visible wavelengths is fabricated quickly, and the theoretical and experimental diffraction efficiencies are both higher than 90%. Therefore, SDL should be a useful tool for fabrication of large-sized gratings.Scanning Dammann lithography （SDL） is proposed and implemented, which uses a Danunann grating to generate multiple beams with sharp step boundary for writing large-sized gratings efficiently. One of the most attractive advantages is that this technique can accelerate tile writing speed, e.g. 1×32 Damnlann grating can be 32 times faster than the single laser scanning system. More importantly, the uniformity of the multi-beams-written lines is much better than the single la.ser beam scanning system in consideration of the environlnental effects such as air turbulence, thermal instability, etc. Using the SDL system, a three-port high-efficiency beam splitter at visible wavelengths is fabricated quickly, and the theoretical and experimental diffraction efficiencies are both higher than 90%. Therefore, SDL should be a useful tool for fabrication of large-sized gratings.

关 键 词：SDL Parallel laser writing system with scanning Dammann lithography 

分 类 号：TH744.5[机械工程—光学工程]