316L不锈钢表面脉冲电镀钯的性能  

Properties of palladium film on 316L stainless steel substrate by pulse current plating

作　　者：桂晶[1] 左禹[1] 

机构地区：[1]北京化工大学材料科学与工程学院,北京100029

出　　处：《电镀与涂饰》2014年第16期677-680,共4页Electroplating & Finishing

基　　金：国家科技支撑计划(2012BAE04B01)

摘　　要：以316L不锈钢为基体,分别采用脉冲电镀和直流电镀法制备了钯膜层。对比研究了脉冲电镀钯和直流电镀钯的微观结构、显微硬度、孔隙率、耐蚀性等性能。与直流电镀钯膜层相比,脉冲电镀钯膜层更为均匀、致密,晶粒尺寸更小,孔隙率更低,显微硬度更高,附着力更强。另外,脉冲电镀钯膜层在80°C的20%H2SO4和20%H2SO4+0.001 mol/L Cl-中的耐腐蚀性均优于直流电镀钯膜层。Palladium films were prepared on 316L stainless steel substrates by pulse and direct current plating, respectively. The properties of the palladium films prepared by pulse and direct current plating such as microstructure, microhardness, porosity, and corrosion resistance were comparatively studied. It is indicated that the pulse current plated palladium film has more uniform and compact surface, smaller crystal size, lower porosity, higher microhardness, and stronger adhesion than the direct current plated palladium film. The corrosion resistance of the pulse current plated palladium film in both 20% H2SO4 and 20% H2SO4 ＋ 0.001 mol/L Cl^- solutions at 80 ℃ is superior to that of the direct current plated one.

关 键 词：不锈钢 钯 脉冲电镀 微观结构 耐蚀性 

分 类 号：TQ153.19[化学工程—电化学工业]