硝酸介质对铝箔直流脉冲电蚀电流密度的影响  

Effects of the nitric acid on the current density during DC impulse etching of aluminum foil

作　　者：刘丹露[1] 徐丹[1] 肖仁贵[1,2] 王建中 邹腾[1] 

机构地区：[1]贵州大学化学与化工学院,贵州贵阳550025 [2]江苏中联科技集团,江苏南通226361

出　　处：《电子元件与材料》2014年第9期34-37,共4页Electronic Components And Materials

基　　金：江苏省科技支撑计划(工业)资助项目(No.BE2012095);贵州大学引进人才基金资助项目;贵州大学研究生创新基金资助项目

摘　　要：通过在硫酸一盐酸混合电解质中加入硝酸，研究了在直流脉冲电蚀铝箔的过程中，硝酸介质对电蚀电流密度的影响。结果表明：在硫酸和盐酸电解质体系中，直流脉冲的峰值电流密度需大于0．8A·cm^-2。才能在铝箔表面生成隧道孔，但在加入0．2～0．3mol／L硝酸后可将生成隧道孔所需的电流密度降至0．3A·cm^-2。在3mol／L硫酸及1mol／L盐酸的混合溶液实验条件下，电解质中适宜的硝酸浓度为0．2mol／L。The effects of current density after adding nitric acid into H2SO4-HCI system during DC impulse etching of aluminum foil were discussed. The results show that the tunnels can be formed while controlling DC impulse current density above 0.8A·cm^-2 in H2SO4-HCI electrolyte system. It＇s obviously that the current density can be lower to 0.3A·cm^-2 by adding nitric acid at the concentration of 0.2-0.3 mol/L. Under the condition of mixed solution of 3 mol/L H2SO4 and 1 mol/L HCI, the proper concentration of nitric acid is 0.2 mol/L.

关 键 词：铝箔 脉冲电流 电化学腐蚀 隧道孔 硝酸 生长规律 

分 类 号：TM535[电气工程—电器]