光电设备激光防护技术研究进展  

Research progress of laser protection for photoelectrical devices

作　　者：张玉发[1] 孙晓泉[1] 

机构地区：[1]脉冲功率激光技术国家重点实验室,安徽合肥230037

出　　处：《激光与红外》2014年第9期957-965,共9页Laser & Infrared

摘　　要：为削弱激光对光电设备的损伤,提高复杂战场环境下光电系统的生存能力,光电设备需要采取必要的防护措施。总结了目前基于线性、非线性和相变的激光防护技术和材料,包括薄膜结构、光子晶体结构、聚合物结构、微镜结构等,分别说明了各种结构的防护机制、性能参数、适应性等指标以及未来的研究方向,最后指出激光防护技术的发展趋势。In order to decrease the optical damage of laser to photoelectrical devices and improve the viability of photo-electrical system in the complex battlefield,the devices usually require laser protection.Laser defending materials and technologies based on the principle of linear optics,nonlinear optics and phase transition are summarized,which in-cluded film,photonic crystal,polymer and digital micromirror device etc.The parameters,mechanism,applicability and guideline of these materials are also introduced respectively.Finally,the future directions of laser protective tech-nology are pointed out.

关 键 词：激光防护 激光防护材料 非线性光学 光限幅 

分 类 号：TJ95[兵器科学与技术—武器系统与运用工程]