POSS改性聚亚苯基硅氧烷的合成与表征  

Synthesis and Characterization of POSS Modified Poly( silphenylenesilxoane) s

作　　者：王度[1] 邱本陆[1] 

机构地区：[1]浙江新安化工集团股份有限公司,浙江建德311600

出　　处：《有机硅材料》2014年第5期349-353,共5页Silicone Material

摘　　要：以α,ω-二羟基聚(四甲基对硅亚苯基)硅氧烷为起始原料,分别与1,4-双(甲基氯硅基)苯和甲基二氯硅烷反应,合成了两种带硅氢基的聚亚苯基硅氧烷P1和P2;然后,再与烯丙基七戊基低聚倍半硅氧烷(烯丙基七戊基POSS)进行硅氢加成反应,引入POSS侧基,合成了POSS-P1和POSS-P2。经1H NMR和29Si NMR分析证实得到了目标产物;GPC分析表明,两种聚合物经POSS改性后摩尔质量均增大,摩尔质量分布变宽;DSC和TGA分析表明,两种聚合物经POSS改性后熔点分别提高8.4℃和10.6℃,热质量损失率达到5%时的温度分别提高197℃和162℃,且均在400℃以上。P1 and P2 poly（silphenylenesiloxane）s polymer with Si-H group were successfully obtained by hydrosilylation of α,ω-dihydroxyl poly （tetramethylsilphenylene ）siloxane and 1 ,4-bis （methylchlorosilyl ） benzene or methyldichlorosilane,respectively. Then the polyhedral oligomeric silsesquioxanes （POSS）with allyl group were introduced into poly（silphenylenesiloxane）as the functional side-groups by hydrosilylation to get the polymers of POSS-P1 and POSS-P2 . ^1 H NMR and ^29 Si NMR analysis confirmed that the target polymer was obtained. GPC analysis showed that the molar mass of both polymers increased,and the molar mass distributions became broader after modified by POSS. DSC and TGA analysis showed that the melting points of two POSS-modified polymers increased by 8. 4℃ and 10. 6 ℃,respectively,and the temperatures （the mass loss rate of 5%）increased to 197 ℃ and 162 ℃ respectively,all above 400 ℃.

关 键 词：聚亚苯基硅氧烷 α ω-二羟基聚(四甲基对硅亚苯基)硅氧烷 烯丙基 POSS 1 4-双(甲基氯硅基)苯 甲基二氯硅烷 

分 类 号：O634.41[理学—高分子化学]