锰掺杂氧化镍薄膜的电沉积及性能  

Electrodeposition and Properties of Mn-doped NiO Thin Films

作　　者：陈娜[1] 苏革[1] 柳伟[1] 曹立新[1] 马德文[1] 戚新颖[1] 

机构地区：[1]中国海洋大学材料科学与工程研究院,山东青岛266100

出　　处：《材料工程》2014年第11期67-72,共6页Journal of Materials Engineering

基　　金：山东省自然科学基金(ZR2010EM027);青岛市科技计划基础研究项目应用基础研究资助项目(11-2-4-1-(2)-jch)

摘　　要：通过有机体系电化学沉积法制备了未掺杂及锰掺杂氧化镍薄膜,并通过SEM、EDS、紫外-可见分光光度计和电化学工作站对其形貌、成分、光学及电化学性能进行了研究。结果显示:薄膜由团聚颗粒构成,锰的掺入使团聚颗粒细化,随锰掺入量的增大,薄膜颗粒出现择优方向聚集,形成蠕虫状;锰掺杂还使薄膜的光学及电学性能得到改善,薄膜在550nm处的透光率差值由68%提高到93%,着色效率增至30.9mC·cm-2;电致变色可逆性得到明显改善,响应(消色/着色)时间有所减小。Undoped and Mn-doped NiO electrochromic thin films were synthesized by electrochemical deposition on FTO conducting glasses in organic system. The effect of Mn doping on the morphology, composition, optical and electrochemical properties of the NiO films were investigated by means of scanning electronic microscope (SEM), energy disperse spectroscopy (EDS), ultraviolet-visible (UV-vis) spectrophotometer and electrochemical workstation. The results show that the Mn-doped NiO films are formed by some elaborative agglomerated particles, which grow into worm-like particles when the dosage is bigger. The optical and electrical properties of NiO film are improved by Mn doping. The transmittance variation of the NiO film at 550 nm doped with a moderate amount of Mn reaches 93%, while the undoped NiO film is only 68%. The coloration efficiency increases up to 30.9 mC·cm-2, the reversibility improves, and the response (decoloration/coloration) time decreases.

关 键 词：锰掺杂氧化镍薄膜 电致变色性能 有机体系电沉积 

分 类 号：O484[理学—固体物理]