超低压等离子喷涂技术及应用  

Application and Development of Low Pressure Plasma Spray-Thin Film

作　　者：倪立勇[1] 戚鹏[1] 杨震晓[1] 杨杰[1] 吴朝军[1] 

机构地区：[1]航天材料及工艺研究所,北京100076

出　　处：《热喷涂技术》2014年第3期7-12,共6页Thermal Spray Technology

摘　　要：超低压等离子喷涂技术是热喷涂领域出现的一项新技术。该技术融合了传统等离子喷涂技术以凝固为主形成涂层和气相沉积技术以气/固方式沉积薄膜的特征。该技术适合快速大面积薄涂层制备,可实现涂层微结构控制(层状结构、柱状结构及混合结构涂层)。本文主要介绍了超低压等离子喷涂技术的特点、分类、设备组成,重点介绍了该技术的潜在应用。Low Pressure Plasma Spray-Thin Film （LPPS-TF） is a novel emerging technology of thermal spraying. The technology combines the traditional plasma spraying technology to solidify of the coating and vapor deposition technology for gas/solid characteristic of thin film. It is suitable for rapid large-area thin coating preparation, and also can be deposited different microstructure coating （lamellar, columnar or mixed structured coatings）. This paper describes the characteristics, classification, equipment components of LPPS-TF, focusing on the potential applications of the technology.

关 键 词：超低压等离子喷涂技术 柱状晶结构涂层 热障涂层 

分 类 号：TG174.4[金属学及工艺—金属表面处理]