超低压等离子喷涂YSZ涂层显微组织结构研究  

Microstructure of Yttrium Stabilized Zirconia Coating by Plasma Spray-Physical Vapor Deposition

作　　者：杨震晓[1] 倪立勇[1] 戚鹏[1] 马康智 杨杰[1] 吴朝军[1] 

机构地区：[1]航天材料及工艺研究所,北京100076

出　　处：《热喷涂技术》2014年第3期24-28,共5页Thermal Spray Technology

摘　　要：采用超低压等离子喷涂技术(Plasma Spray-Physical Vapor Deposition,PS-PVD)制备了YSZ涂层,对涂层的显微组织结构进行了分析,并对比了粘结层表面不同预处理对于YSZ涂层生长趋势的影响规律。研究结果表明:MCrAlY涂层致密,孔隙率为1.5%,结合强度达83.2MPa;YSZ涂层呈现明显的柱状晶结构。粘结层表面粗糙度对柱状晶生长方向影响较大,表面粗糙度越小,柱状晶生长方向越趋于一致,基本沿法向生长。在超低压状态下,涂层不存在"遮蔽效应",可实现异型面涂层制备。Yttrium stabilized zirconia coatings （YSZ） was prepared by plasma spray-physical vapor deposition, and the growth trends of YSZ coating with adhesive layers that pretreated by different methods were compared. The results show that： MCrA1Y coating was very dense, shown a good combination with substrate. And the microstructure of YSZ coating was columnar structure. Meanwhile, the growth direction of YSZ columnar structures was influenced by the surface roughness of adhesive layers, and lower roughness lead to an same growth direction of columnar structure which was always normal to the surface of the adhesive layer. Besides, no shade effect exsited in the YSZ coating deposition during PS-PVD, it can be used to spray parts with complex shape.

关 键 词：超低压等离子喷涂 柱状晶结构 YSZ涂层 

分 类 号：TG174.4[金属学及工艺—金属表面处理]