(Ni-P)-SiO_2化学复合镀液中分散剂的研究  

Studies on the Dispersant in( Ni-P)-SiO_2 Composite Electroless Plating Bath

作　　者：陈尔跃[1] 杨晓超[1] 徐娟[1] 郭祥峰[1] 

机构地区：[1]齐齐哈尔大学化学与化学工程学院,黑龙江齐齐哈尔160006

出　　处：《电镀与精饰》2014年第10期12-16,共5页Plating & Finishing

基　　金：黑龙江省高校科研创新团队项目(项目编号2012TD012)

摘　　要：在铜表面上的（Ni-P）-SiO2化学复合镀中,将Al2（SO4）、CoSO4和CrCl3作为纳米SiO2分散剂添加到镀液中.由分光光度计测定发现少量金属盐对纳米SiO2粒子在镀液中的分散稳定性均有一定程度提高.通过光电子能谱检测发现,Al2（SO4）3作为纳米SiO2分散剂的（Ni-P）-SiO2化学复合镀层中纳米SiO2沉积效果优于其他分散剂.0～8nm深度刻蚀检测表明镀层中纳米SiO2质量分数稳定.实验表明,以Al2（SO4）3作为分散剂最佳质量浓度为3.06～ 4.08 g/L.Using Al2 （SO4） 3,CoSO4,CrCl3 as nano-SiO2 dispersants and putting them into the plating bath during（Ni-P）-SiO2 composite electroless plating on copper substrates.It was found that a little amount of metal salts could improve the nano-SiO2 dispersing stability to a certain extent in the plating bath by spectrophotometer determination.By photoelectron spectroscopy detection,it was found that when using Al2 （SO4） 3 as dispersant,the SiO2 deposition effect in composite coatings was better than that of other coatings.0 ～8 nm depth etching detection showed that the nano-SiO2 mass fraction in the coating was stable.Experimental results showed that when using Al2 （SO4）3 as dispersant,the optimum mass concentration should be 3.06 ～ 4.08 g/L.

关 键 词：(Ni-P)-SiO2 化学复合镀 分散剂 纳米SIO2 镀层 

分 类 号：TQ153.2[化学工程—电化学工业]