复合离子束制备氮化物多层膜的抗冲蚀性能  

Erosion Resistance Performance of Different Nitride Films Deposited by Composite Ion Beam

作　　者：金杰[1] 王丽叶[1] 黄晓林[1] 孟祥宇[1] 陈蕴博[2] 高克玮[3] 

机构地区：[1]北京机械工业自动化研究所电器物理设备与应用工程技术中心,北京100120 [2]机械科学研究总院先进制造技术研究中心,北京100083 [3]北京科技大学材料科学与工程学院,北京100083

出　　处：《中国表面工程》2014年第5期32-38,共7页China Surface Engineering

基　　金：北京机械工业自动化研究所基金(10211169032)

摘　　要：为了在TC4钛合金上获得抗冲蚀性能优良的膜层,利用金属蒸发真空多弧(Metal evaporation vacuum arc,MEVVA)离子源和阴极真空磁过滤弧复合离子束沉积技术在TC4钛合金基材表面制备Cr/Cr-N、Ti/Ti-N、Cr-Ti/Cr-Ti-N、Ti-Al/Ti-Al-N 4种体系的多层膜。采用努普显微硬度计、划痕仪、微粒喷浆冲蚀试验机、场发射扫描电子显微镜(FESEM)、体式显微镜等仪器对不同体系膜层的力学性能及形貌进行测试表征,对比研究各膜层体系抗冲蚀性能的机理。结果表明:该技术制备的膜层致密、交替层结构明显;不同膜层体系的抗冲蚀性能差异较大,尤以二元金属及其氮化物交替复合多层膜具有较好的抗冲蚀性能,其中CrTi/Cr-Ti-N体系的膜层抗冲蚀性能相比基体提高10.1倍以上,其次为Ti-Al/Ti-Al-N、Ti/Ti-N、Cr/Cr-N,分别提高6.1倍、4.1倍和2.3倍。In order to prepare better erosion resistance films on TC4 titanium alloy,Cr/Cr-N,Ti/Ti-N,Cr-Ti/Cr-Ti-N,and Ti-Al/Ti-Al-N films were prepared on TC4 titanium alloys with metal evaporation vacuum arc（MEVVA）ion source and filter cathodic vacuum arc deposition technology.Erosion resistance mechanical properties and surface characters of different films were studied by employing Knoop hardness,scratch resistance tester,solid particle impact machine（slurry jet）,field emission scanning electron microscope（FESEM）and optical microscope.The results show that the films are compacted and with alternated distinctly layers.The different films show great differences in erosion resistance,especially in the binary alloy and its multilayers nitride films in comparison with single metal and its multilayers nitride films.The erosion resistance of Cr-Ti/Cr-Ti-N has improved over 10.1times compared with that of the substrate,followed by Ti-Al/Ti-Al-N,Ti/Ti-N,and Cr/Cr-N films improved 6.1,4.1,2.3times,respectively.

关 键 词：MEVVA离子源 阴极真空磁过滤 多元氮化物 抗冲蚀 

分 类 号：TG174.444[金属学及工艺—金属表面处理]