活性稀释剂对有机硅混杂光固化体系感光性能的影响  

Effect of Reactive Diluents on Photosensitivity of Si-containing Hybrid UV-Curing System

作　　者：孙芳[1] 黄毓礼[2] 杜洪光[1] 

机构地区：[1]北京化工大学理学院,北京100029 [2]北京化工大学材料科学与工程学院,北京100029

出　　处：《精细化工》2002年第8期463-465,共3页Fine Chemicals

基　　金：国家自然科学基金资助项目 (2 97760 0 2 )

摘　　要：自由基活性稀释剂TEGDA在含硅聚氨酯丙烯酸酯ISAE与环氧化合物组成的混杂光固化体系中m(TEGDA)∶m(ISAE) =1∶2时 ,体系感度较高 ,感度值可达 2 18 5mJ/cm2 。带有叔胺结构的活性稀释单体NVP的加入不利于提高混杂体系的感度 ,其感度值大于 1980mJ/cm2 。阳离子型活性稀释单体 1,2 ,3 丙三醇缩水甘油醚 (EPON - 812 )和 3,4 环氧基环己基甲酸 3′,4′ 环氧基环己基甲酯 (ERL - 4 2 2 1)组成的混合阳离子稀释剂的使用提高了混杂体系的感度和凝胶率 ,感度值下降至 10 5 6mJ/cm2 。The photosensitivity of hybrid UV curing system composed of Si containing polyurethane acrylate oligomer ISAE and epoxy compounds was amplified and the value of photosensitivity was 218 5 mJ/cm 2 when the weight ratio of triethyleneglycol diacrylic ester(TEGDA) to ISAE was 1∶2. N Vinylpyrrolidone(NVP),the reactive diluent with tert amino group,decreased photosensitivity of the hybrid systems and the values of photosensitivity were more than 1980 mJ/cm 2.Photosensitivity and gel yield of hybrid system were increased by adding the mixture of cationic reactive diluents EPON-812 and ERL-4221,and the value of photosensitivity of hybrid system dropped to 105 6 mJ/cm 2.

关 键 词：活性稀释剂 有机硅 混杂 光固化体系 感光性能 影响 

分 类 号：TQ572.4[化学工程—精细化工]