晶圆显影过程中喷嘴液滴运动的数值计算  

The Numerical Computation of the Drop Motion in the Process of the Wafer Development

作　　者：刘学平[1,2] 王汉[1,2] 徐强[1,2] 

机构地区：[1]清华大学深圳研究生院先进制造学部,深圳518055 [2]清华大学机械工程学院绿色制造实验室,北京100039

出　　处：《机械设计与制造》2014年第10期1-4,共4页Machinery Design & Manufacture

基　　金：国家科技重大专项02专项资助项目(2012ZX02102)

摘　　要：集成电路制造过程中对晶圆显影工艺的均匀性有很高的要求,重点在于保证显影喷嘴出口—毛细管出流液滴的体积和滴落频率稳定。采用有限体积法对液滴的形成及脱落过程的纳维斯托克斯方程进行了求解,并对轴对称毛细管模型进行了结构化网格的划分,通过VOF(volume of fluid)模型针对液滴变化过程中的气液两相界面进行了追踪。分析了毛细管中流量逐渐加大对液滴低落频率及液滴体积的影响,并研究了在液体流速低于和高于临界流速的不同情况时不同的滴落过程。该研究有助于显影喷嘴设计过程中确定出口毛细管管径的大小、间距以及额定工作流量。In the process of intergrated circuit manufacturing, the uniformity of the development process is very important, and the key point is to make sure the drop flowing out of the capillary has a stable frequency and volume. The Navier-Stocks equation describing the process of the drop is solved by the finite volume method, and the structured grid is meshed for the axial symmetry model of the capillary, then the interface of the two different phases, vapor phase and liquid phase, is tracked by the model of VOF （volume of fluid）. The influence of the liquid phase velocity in the capillary to the frequency and the volume of drop is analyzed, and the difference of the dripping process of the drop when the velocity is lower or higher than the critical velocity is studied. The result contributes to the designing of the developing nozzle.

关 键 词：有限元计算 液滴形成 两相流模型 临界流速 

分 类 号：TH16[机械工程—机械制造及自动化] TH122