用于片式电阻浆料的二氧化钌粉的制备  

Preparation of Ruthenium Dioxide Powder for Chip Resistor Slurry

作　　者：陆冬梅 王要东 王大林 孙社稷 雷莉君 

机构地区：[1]西安宏星电子浆料科技有限责任公司,西安710065

出　　处：《微电子学》2014年第5期696-700,共5页Microelectronics

摘　　要：以钌粉、硝酸钾、氢氧化钾为原料,水为反应介质,选用特定的还原剂和添加剂,利用液相化学还原沉淀法,并通过烘干和焙烧处理,得到了粒度分布较窄、分散性较好的二氧化钌粉,满足了片式电阻浆料的需要。采用干法激光粒度仪测试二氧化钌粉的粒度分布与平均粒径,用扫描电子显微镜(SEM)分析二氧化钌粉的形貌、粒径和团聚状态,用X射线衍射仪(XRD)检测粉体的晶相,并简要讨论了影响二氧化钌粉制备过程的各类因素。With ruthenium powder, potassium nitrate, potassium hydroxide as raw material, water as reaction medium, choose specific reducing agent and additive, using chemical reduction in liquid phase precipitation method, and through drying and roasting processing, a kind of ruthenium dioxide powder had been obtained with narrower particle size distribution and good dispersion, meeting the needs of the chip resistor paste. The particle size distribution and average particle size of the ruthenium dioxide powder were tested by the dry laser particle size analyzer. The ruthenium oxide powder＇s morphology, particle size and agglomeration state were analyzed by the scanning electron microscopy （SEM）. The powder crystal phase was tested by the X ray diffractometer（XRD）. And the impacts on the ruthenium dioxide powder preparation process had been discussed briefly.

关 键 词：液相化学还原法 钌酸钾 分散性 粒度 

分 类 号：TN604[电子电信—电路与系统]