低温离子渗硫技术研究现状及展望  

Research Status and Prospects of Low-temperature Ion Sulfurizing Technology

作　　者：崔娜 韩彬[1] 王勇[1] 

机构地区：[1]中国石油大学(华东)机电工程学院,山东青岛266580

出　　处：《表面技术》2014年第6期131-137,共7页Surface Technology

基　　金：国家自然科学基金面上项目(51179202);山东省自然科学基金(ZR2009FM030);青岛市科技发展指导计划项目(KJZD-12-44-jch);清华大学摩擦学国家重点实验室开放基金资助项目(SKLTKF13B04)~~

摘　　要：低温离子渗硫技术克服了传统渗硫方法的不足,是目前最常用的Fe S固体润滑薄膜制备方法。由于存在理论研究尚未完善、应用材料相对单一、微纳米硫化物薄膜表征困难等问题,该技术的应用推广及其工业化进程受到限制。综述了离子渗硫技术在渗硫机理、工艺研究、硫化物薄膜表征及渗硫层摩擦学性能等方面的研究进展,分析了渗硫层减摩作用机理和当前离子渗硫应用的基体材料类型,指出了其未来的发展方向。Low-temperature ion sulfurizing technology overcomes many shortcomings existing in traditional sulfurizing methods, and has become the most commonly used preparation method of ferrous sulfide solid lubrication film. However, its theoretical study is not perfect yet, the sorts of materials applied are relatively deficient, and the characterization of micro/nano sulfide layer is difficult, all these factors restrict its promotion and industrialization process. The achievements and disadvantages of ion sulfurizing technology based on principle and process research, characterization of sulfide film and its tribological properties were presented in this paper. The anti-friction mechanism of sulfide layer was discussed. The substrate types of ion sulfurizing were introduced and the future prospects of ion sulfurizing technology were proposed.

关 键 词：低温离子渗硫 硫化物薄膜 减摩机理 

分 类 号：TG174.445[金属学及工艺—金属表面处理]