多弧离子镀制备TiN/TiAlN多层薄膜表面形貌与成分研究  

Study on surface morphology and composition of TiN/TiAlN multi-layer film deposited by multi-arc ion plating method

作　　者：张桂如 丁龙先[1] 张弛 王培芬[3] 

机构地区：[1]沈阳大学机械工程学院,沈阳110044 [2]常州星宇车灯股份有限公司生产技术部,常州213001 [3]河北化工医药职业技术学院,石家庄050026

出　　处：《真空》2014年第6期32-35,共4页Vacuum

摘　　要：采用多弧离子镀技术在高速钢基体上制备了TiN/TiAlN多层薄膜,用扫描电镜及能谱仪对膜层表面形貌和成分进行了观察与分析,结果表明:随钛靶电流的增大,小液滴的尺寸不仅增大,而且形状更不规则,而无液滴处的Al/Ti原子比呈递减规律;随基体偏压的降低,小液滴有减少的趋势,但这一趋势并不明显,而无液滴采集点的Al/Ti原子比也呈递减规律;基体偏压和钛靶电流对较大尺寸的液滴的影响不大。TiN/TiAlN multi-layer film was deposited on high speed steel by multi-arc ion plating technology. The surface mor- phology and composition of the film were observed and analysed by scan electronic microscope （SEM） and energy dispersive spectrometer（ EDS ）. The results show that the size of small droplets not only become larger but also more irregular in shape with the increasing of Ti target current. Also the atoms ratio of Al/Ti decreases progressively in the no-droplet area. The small droplets may have a decrease tendency which is not obvious and the atoms ratio of Al/Ti decreases progressively also in the nodroplet area with bias voltage decreasing. Bias voltage and Ti target current have a little influence on big droplets.

关 键 词：多弧离子镀 TiN/TiAlN多层薄膜 表面形貌 成分分析 

分 类 号：TB43[一般工业技术] O484[理学—固体物理]