W波段扩展互作用速调管电子光学系统  

Electron optics system for W-band extended interaction klystron

作　　者：邓德荣[1] 李文君[1] 单李军[1] 曾造金 周霖[1] 

机构地区：[1]中国工程物理研究院应用电子学研究所,四川绵阳621900 [2]电子科技大学物理电子学院,成都610054

出　　处：《强激光与粒子束》2014年第11期105-109,共5页High Power Laser and Particle Beams

基　　金：中国工程物理研究院预研基金项目

摘　　要：W波段扩展互作用速调管电子光学系统由皮尔斯电子枪与均匀永磁聚焦系统组成,用于电子注的产生与传输。利用Vaughan迭代综合法及数值模拟优化设计了皮尔斯电子枪,并按照电子注传输特性要求研制了均匀永磁聚焦结构。根据电子光学系统的三维模拟,导流系数0.21μP,注电流大于0.5A,注平均半径小于0.3mm,射程大于11mm。永磁聚焦磁场约0.33T,传输距离大于50mm,电子注通过率达到100%。电子枪与聚焦系统已加工完毕并通过测试,技术指标满足要求。Electron optics system of W-band extended interaction klystron （EIK） which produces and transfers electron beam consists of Pierce electron gun and uniform permanent magnetic system.The Pierece electron gun is designed and optimized through Vaughan synthesis method and numerical simulation.What is more,the uniform permanent magnetic structure is developed according to transport character requirements of electron beam.Due to 3D program simulation of electron optics system for W-band EIK,parameters of gun are perveance of 0.21 μP,current of more than 0.5 A,average waist radius of less than 0.3 mm and gunshot of more than 11 mm.In the permanent magnetic focusing system,magnetic field is about 0.33 T.Transmission distance of electron beam is more than 50 mm and transfer efficiency achieves 100%.The gun and focusing system are completely developed and product testing shows technical parameters satisfy the requirements.At present,the electron optics system for Wband EIK is in the state of installation and experiment.

关 键 词：扩展互作用速调管 电子光学系统 电子枪 聚焦磁场 传输特性 

分 类 号：TL503[核科学技术—核技术及应用]