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作 者:石永敬[1,2] 潘复生[1] 鲍明东[3] 潘虎成 Muhammad RASHAD
机构地区:[1]重庆大学材料科学与工程学院,重庆400044 [2]重庆科技学院冶金与材料学院,重庆401331 [3]宁波工程学院材料工程研究所,宁波315016
出 处:《Transactions of Nonferrous Metals Society of China》2014年第9期2856-2863,共8页中国有色金属学报(英文版)
基 金:Project(50725413)supported by the National Natural Science Foundation of China;Project(2010BB4290)supported by Natural Science Foundation Project of CQ CSTC,China
摘 要:Nano-scaled ZrNbAlN films with different negative bias voltages(Vb) were deposited on bronze substrate and Si(100) wafers by a reactive unbalanced magnetron sputtering technique. Composition and structure properties were characterized by X-ray photoelectron spectroscopy and X-ray diffraction. It is found that mole concentrations of Zr and Nb are affected by Vb, which leads to the increase of binding energy of N 1s and Al 2p and decrease of binding energy of Zr 3d5/2 and Nb 3d5/2. Surface morphologies evolution controlled by Vb could be observed. Furthermore, X-ray diffraction patterns reveal that these films show a(111) preferred orientation. Moreover, mechanical property and corrosion behavior of ZrNbAlN films were characterized by nanoindentation test and corrosion test, respectively. A maximum value of 21.85 GPa at-70 V occurs in the ZrNbAlN- bronze system, which outperforms uncoated bronze. Corrosion experiments in 0.5 mol/L NaCl and 0.5 mol/L HCl solution show that corrosion potential and corrosion current are dependent on Vb, and better anti-corrosion property could be obtained at-90 V.采用反应非平衡磁控溅射技术在青铜及Si(100)衬底上沉积不同负偏压(Vb)的纳米ZrNbAlN薄膜。薄膜结构及成分采用X射线光电子能谱及X射线衍射进行表征。结果表明,Zr和Nb的原子浓度受负偏压影响,Vb导致N 1s谱和Al 2p谱的结合能增加及Zr 3d5/2和Nb 3d5/2谱的结合能降低,薄膜表面形貌的演化受控于Vb。X射线衍射谱显示这些薄膜具有(111)择优取向。此外,薄膜的力学特性及腐蚀行为分别通过纳米压痕测试及腐蚀测试表征。当负偏压为-70 V时,纳米压痕测试显示的最大显微硬度为21.85 GPa,ZrNbAlN膜在青铜衬底上的性能远优于未涂层处理的衬底。在0.5 mol/L NaCl和0.5 mol/L HCl溶液中的腐蚀实验表明,腐蚀势能及腐蚀电流依赖于衬底偏压,在-90 V时能够获得较高的抗腐蚀特性。
关 键 词:ZrNbAlN multilayer film magnetron sputtering COMPOSITION CORROSION
分 类 号:TB383.2[一般工业技术—材料科学与工程]
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