钼靶材变形量及热处理对薄膜微观组织及性能的影响  

Effect of deformation and heat treatment of molybdenum target on the microstructure and properties of film

作　　者：刘仁智[1,2] 王快社[1] 孙院军[2] 

机构地区：[1]西安建筑科技大学,陕西西安710055 [2]金堆城钼业股份有限公司技术中心,陕西西安710075

出　　处：《粉末冶金技术》2014年第5期328-334,351,共8页Powder Metallurgy Technology

基　　金：国家科技支撑计划课题(2012BAE06B02)

摘　　要：通过研究靶材变形量及热处理工艺对溅射薄膜的微观组织、表面粗糙度及晶形的影响,结果表明:变形量为80%的钼靶材溅射制备的薄膜晶化程度优于变形量小的靶材溅射薄膜;溅射相同的薄膜厚度,随着靶材变形量的增大,溅射薄膜的方阻越大;1 100℃退火靶材溅射薄膜的粗糙度最小,表面颗粒最细小均匀,晶粒取向明显。The effects of deformation and heat treatment of molybdenum target on the microstructure,surface roughness and crystalline form of sputtered film were studied.The results show that crystallization of film sputtered by target with deformation ratio over 80% is better than that of below 80%.When the sputtering films thickness is the same,the sheet resistance of sputted film increase with increasing deformation of Mo target.The films sputtered by Mo target annealed at 1 100 ℃ have the lowest roughness,the finest surface particles and obvious grain orientation.

关 键 词：钼 靶材 微观组织 溅射 性能 

分 类 号：TG161[金属学及工艺—热处理]