设计模式在光刻版清洗系统软件设计中的应用  

Application of Design Patterns in Software Design of the Photomask Cleaning System

作　　者：侯为萍[1] 高建利[1] 刘玉倩[1] 

机构地区：[1]中国电子科技集团公司第四十五研究所,北京101601

出　　处：《电子工业专用设备》2014年第4期38-41,共4页Equipment for Electronic Products Manufacturing

摘　　要：设计模式代表了成功的可复用的优秀设计经验,在系统设计中引入设计模式将有效地提高系统的可扩展性和可维护性。在光刻版清洗系统软件设计中引入了设计模式,介绍了设计模式的概念及使用,描述了单件模式,策略模式和适配器模式在光刻版清洗系统软件设计中的应用。经实践检验,设计模式的应用,增强了设计的灵活性,提高了软件的可扩展性和复用性。该方法具有较高的理论和实践意义。D esign patterns represent excellent and reusable design experience. A pplication of design patterns in system design w illenhance the scalability and m aintainability ofthe system effectively.This paper applies the design patterns in softw are design of the photom ask cleaning system ,introduces the concept and use of design patterns,describes the application of singleton pattern,strategy pattern and adapter pattern in softw are design of the system . T he practical result verifies that application of design patterns in system design im proves the design flexibility,enhances the expansibility and reusable of the softw are.T his m ethod has certain theoretical and practical significance.

关 键 词：光刻版清洗系统 设计模式 软件设计 

分 类 号：TN305[电子电信—物理电子学]