γ-TiAl合金表面磁控溅射与电弧离子镀制备Al涂层高温氧化行为的比较(英文)  

A Comparison of Oxidation Behavior of Al Coatings Prepared by Magnetron Sputtering and Arc Ion Plating onγ-TiAl

作　　者：徐一[1] 缪强[1] 梁文萍[1] 王玲[1] 于修水 任蓓蕾[1] 姚正军[1] 

机构地区：[1]南京航空航天大学,江苏南京210016

出　　处：《稀有金属材料与工程》2014年第11期2652-2656,共5页Rare Metal Materials and Engineering

基　　金：National Natural Science Foundation of China(51174119);the Funding of Jiangsu Innovation Program for Graduate Education(CXZZ12_0149);the Fundamental Research Funds for the Central Universities;the Aeronautical Science Foundation of China(2012ZF52071)

摘　　要：利用XRD、EDS和SEM分析研究了磁控溅射和电弧离子镀2种工艺制备的Al涂层的微观结构、形貌和抗氧化性能。磁控溅射技术制备的均匀、致密的Al层拥有更为细小的晶粒组织。在氧化实验后,磁控溅射制备的Al涂层形成了一个由表层氧化层、次表层富Al层和互扩散层的保护性结构。相比之下,电弧离子镀制备的Al涂层表现出了更差的抗氧化性。这是由于在离子镀制备的Al涂层中发现的针孔可以为氧气的侵入提供通道,从而引起涂层的内氧化并最终导致涂层的剥离。结果表明,磁控溅射制备Al涂层具备更好的抗高温氧化性能。The micro-structure, the morphology and the oxidation resistance of AI coatings deposited using magnetron sputtering （MS） and arc ion plating （ALP） were investigated by means of SEM,EDS and XRD. A more compact and uniform A1 coating with small grain size was deposited on y-TiA1 by MS method. A protective surface structure consisting of an oxide scale, an Al-rich layer and an interdiffusion layer was formed after oxidation test. However, the AI coatings prepared by/kiP showed a poorer oxidation re- sistance due to the existence of a large amount of pores in the coatings, which played a role of channels for oxygen transportation and induced seriously the internal oxidation and the coating degradation finally. The non-protective scales consisting of A12O3 and TiO2 were formed after quasi-isothermal oxidation test at 900℃ for 173 h. The results indicate that the AI coatings deposited by MS exhibit a better oxidation resistance than those by AIP.

关 键 词：磁控溅射 电弧离子镀 AL涂层 抗氧化性能 

分 类 号：TG178[金属学及工艺—金属表面处理]